Thin Film Preparation Lab

The thin film system enables the highly controlled deposition of metal, semiconductor and refractory thin films.  Films can be deposited from sub-monolayer coverages to several microns thick.  A focused high energy ion beam can be used to pre-condition substrates and to modify films during and after deposition.  Ion beam assisted deposition is also performed in this chamber.    It is planned to add a wide range of in-vacuo analytical capibilities including UHV AFM/STM, LEED, electrical characterizations and XPS to the system.

UAH-LMaSS Thin film deposition and analysis chamber

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April 26,1999